Journal of Materials Research

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Volume 35, Issue 7

April 2020

Focus Issue: Atomic Layer Deposition for Emerging Thin-Film Materials and Applications

16 articles in this issue

Introduction
Xinwei Wang
Xiangbo (Henry) Meng
Jin-Seong Park
Atomic Layer Deposition for Emerging Thin-Film Materials and Applications 01 April 2020 Pages: 655 - 655
Atomic layer deposition for nonconventional nanomaterials and their applications
Taewook Nam
Hyungjun Kim
Invited Feature Paper — Review 01 April 2020 Pages: 656 - 680
Thin film encapsulation for the organic light-emitting diodes display via atomic layer deposition
Yun Li
Yingfei Xiong
Rong Chen
Invited Feature Paper — Review 01 April 2020 Pages: 681 - 700
Atomic layer–deposited nanostructures and their applications in energy storage and sensing
Zhe Zhao
Ye Kong
Yongfeng Mei
Review 01 April 2020 Pages: 701 - 719
Role of oligomer structures in the surface chemistry of amidinate metal complexes used for atomic layer deposition of thin films
Jonathan Guerrero-Sánchez
Bo Chen
Francisco Zaera
Invited Paper 01 April 2020 Pages: 720 - 731
Multilevel memory and synaptic characteristics of a-IGZO thin-film transistor with atomic layer–deposited Al₂O₃/ZnO/Al₂O₃ stack layers
Dan-Dan Liu
Junxiang Pei
Shi-Jin Ding
Invited Feature Paper 01 April 2020 Pages: 732 - 737
Conformal porous carbon coating on carbon fiber cloth/NiS₂ composites by molecular layer deposition for durable supercapacitor electrodes
Jia-Bin Fang
Chang Liu
Ai-Dong Li
Article 01 April 2020 Pages: 738 - 746
Nanoscale Al₂O₃ coating to stabilize selenium cathode for sodium–selenium batteries
Mohammad Hossein Aboonasr Shiraz
Hongzheng Zhu
Jian Liu
Article 01 April 2020 Pages: 747 - 755
Work function of doped zinc oxide films deposited by ALD
Peter G. Gordon
Goran Bačić
Seán T. Barry
Invited Feature Paper 01 April 2020 Pages: 756 - 761
Controllable atomic layer deposition coatings to boost the performance of LiMn_xCo_yNi_1−x−yO₂ in lithium-ion batteries: A review
Kang Wu
Wenbin Li
Xifei Li
Review 01 April 2020 Pages: 762 - 774
Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications
Woojin Jeon
Review 01 April 2020 Pages: 775 - 794
Atomic layer deposition of cubic tin–calcium sulfide alloy films
Chuanxi Yang
Xizhu Zhao
Roy G. Gordon
Article 01 April 2020 Pages: 795 - 803
Atomic layer deposition of zirconium oxide thin films
Xin Wang
Sujan Kumar Ghosh
Xiangbo Meng
Article 01 April 2020 Pages: 804 - 812
Fabrication of iron carbide by plasma-enhanced atomic layer deposition
Xu Tian
Xiangyu Zhang
Zhongwei Liu
Article 01 April 2020 Pages: 813 - 821
NiS_x@MoS₂ heterostructure prepared by atomic layer deposition as high-performance hydrogen evolution reaction electrocatalysts in alkaline media
Zuyun He
Zheng Guo
Yan Chen
Article 01 April 2020 Pages: 822 - 830
Epitaxial growth of Mg_xCa_1−xO on 4H–SiC(0001) and β-Ga₂O₃\(\left( {\bar 201} \right)\) wide band gap semiconductors with atomic layer deposition
Xiabing Lou
Xian Gong
Roy G. Gordon
Article 01 April 2020 Pages: 831 - 839

Volume 35, Issue 7

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